ASML units density document with newest chipmaking instruments — Excessive-NA EUV gear prints first patterns

ASML has introduced that its first excessive ultraviolet (EUV) lithography software with projection optics that includes a 0.55 numerical aperture (Excessive-NA) has printed its first patterns. The announcement is a significant milestone for each ASML and for Excessive-NA EUV lithography expertise generally. 

“Our Excessive-NA EUV system in Veldhoven printed the first-ever 10 nanometer dense strains,” a statement by ASML reads. “Imaging was achieved after optics, sensors and phases accomplished coarse calibration. Subsequent up: bringing the system to full efficiency. And reaching the identical leads to the sphere.”